Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Authors

Bing Li
Genhua Pan, School of Engineering, Computing and Mathematics
Ahmed Suhail
Kamrul Islam
Neil Avent
Paul Davey, School of Engineering, Computing and Mathematics

ORCID

• Pan, Genhua: 0000-0002-2678-7898
• Davey, Paul: 0000-0003-4786-3316

DOI

10.1016/j.carbon.2017.03.032

Publication Date

2017-07-01

Publication Title

Carbon

Volume

118

First Page

43

Last Page

49

ISSN

0008-6223

Organisational Unit

School of Engineering, Computing and Mathematics

Recommended Citation

Li, B., Pan, G., Suhail, A., Islam, K., Avent, N., & Davey, P. (2017) 'Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition', Carbon, 118, pp. 43-49. Available at: https://doi.org/10.1016/j.carbon.2017.03.032