Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Authors

Bing Li, Imperial College London
Genhua Pan, School of Engineering, Computing and Mathematics
Ahmed Suhail
Kamrul Islam
Neil Avent
Paul Davey, School of Engineering, Computing and Mathematics

ORCID

• Genhua Pan: 0000-0002-2678-7898
• Paul Davey: 0000-0003-4786-3316

DOI Link

10.1016/j.carbon.2017.03.032

Publication Date

2017-01-01

Publication Title

Carbon

Volume

118

ISSN

0008-6223

Acceptance Date

2017-03-10

First Page

43

Last Page

49

Recommended Citation

Li, B., Pan, G., Suhail, A., Islam, K., Avent, N., & Davey, P. (2017) 'Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition', Carbon, 118, pp. 43-49. Available at: 10.1016/j.carbon.2017.03.032