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dc.contributor.authorLi, B
dc.contributor.authorPan, G
dc.contributor.authorAwan, SA
dc.contributor.authorAvent, N
dc.date.accessioned2018-05-23T21:16:41Z
dc.date.available2018-05-23T21:16:41Z
dc.date.issued2014-01-01
dc.identifier.issn2731-6505
dc.identifier.issn2299-3134
dc.identifier.urihttp://hdl.handle.net/10026.1/11564
dc.description.abstract

<jats:title>Abstract</jats:title><jats:p>Here we review commonly used techniques for the production of large area and high quality graphene to meet the requirements of industrial applications, including epitaxial growth on SiC, chemical vapour deposition (CVD) on transition metals and growth from solid carbon source. The review makes a comparison of the growth mechanisms, quality (such as mobility and homogeneity) and properties of the resultant graphene, limitations and the prospect of each production method. A particular focus of the review is on direct (transfer free) growth on dielectric substrate as this is potentially one of the promising techniques for graphene production which can readily be integrated into existing semiconductor fabrication processes.</jats:p>

dc.language.isoen
dc.publisherPortico
dc.subject51 Physical Sciences
dc.subject40 Engineering
dc.subject4018 Nanotechnology
dc.subject5104 Condensed Matter Physics
dc.titleTechniques for Production of Large Area Graphene for Electronic and Sensor Device Applications
dc.typejournal-article
plymouth.issue1
plymouth.volume1
plymouth.publication-statusPublished
plymouth.journalGraphene and 2D Materials
dc.identifier.doi10.2478/gpe-2014-0003
plymouth.organisational-group/Plymouth
plymouth.organisational-group/Plymouth/Faculty of Science and Engineering
plymouth.organisational-group/Plymouth/REF 2021 Researchers by UoA
plymouth.organisational-group/Plymouth/REF 2021 Researchers by UoA/UoA12 Engineering
plymouth.organisational-group/Plymouth/Users by role
plymouth.organisational-group/Plymouth/Users by role/Academics
dc.identifier.eissn2299-3134
dc.rights.embargoperiodNot known
rioxxterms.versionofrecord10.2478/gpe-2014-0003
rioxxterms.licenseref.urihttp://www.rioxx.net/licenses/all-rights-reserved
rioxxterms.typeJournal Article/Review


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